Base Width Modulation MCQ Quiz - Objective Question with Answer for Base Width Modulation - Download Free PDF

Last updated on Apr 21, 2025

Latest Base Width Modulation MCQ Objective Questions

Base Width Modulation Question 1:

An npn BJT is operating in the active region. If the reverse bias across the base-collector junction is increased, then

  1. The effective base width increases and common-emitter current gain increases
  2. The effective base width increases and common-emitter current gain decreases
  3. The effective base width decreases and common-emitter current gain increases
  4. The effective base width decreases and common-emitter current gain decreases

Answer (Detailed Solution Below)

Option 3 : The effective base width decreases and common-emitter current gain increases

Base Width Modulation Question 1 Detailed Solution

2nd Review of GATE 2017 Questions PART 2.docx 4

  • As the reverse-biased base-collector voltage is increased, the transition (or) the depletion region of the base-collector junction is increased resulting in the extension of this region more towards P-side (or base side), thereby reducing the effective base width.
  • This reduction in the effective base-width results in the increase in current gain as well because of the increase in the slope of concentration gradient variation from the emitter side to the collector side.

Top Base Width Modulation MCQ Objective Questions

An npn BJT is operating in the active region. If the reverse bias across the base-collector junction is increased, then

  1. The effective base width increases and common-emitter current gain increases
  2. The effective base width increases and common-emitter current gain decreases
  3. The effective base width decreases and common-emitter current gain increases
  4. The effective base width decreases and common-emitter current gain decreases

Answer (Detailed Solution Below)

Option 3 : The effective base width decreases and common-emitter current gain increases

Base Width Modulation Question 2 Detailed Solution

Download Solution PDF

2nd Review of GATE 2017 Questions PART 2.docx 4

  • As the reverse-biased base-collector voltage is increased, the transition (or) the depletion region of the base-collector junction is increased resulting in the extension of this region more towards P-side (or base side), thereby reducing the effective base width.
  • This reduction in the effective base-width results in the increase in current gain as well because of the increase in the slope of concentration gradient variation from the emitter side to the collector side.

Base Width Modulation Question 3:

For an n-p-n transistor shown below, the collector width and its doping are Wc = 15 μm and 5 × 1018cm-3, the emitter width and its doping are WE = 4 μm and 2 × 1019cm-3, and the Base doping is 5 × 1015cm-3. Also, the minority carrier life time in the Base region is τn = 5 μs

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At punch – through condition, VBC = 10V + Vbi Volts, where Vbi is the built in potential of the Base – collector junction. Assuming Emitter injection efficiency as 1, the thermal voltage VT=KTq=25mV for silicon at T = 300 K, Dn = 30 cm2/s, ϵ = 10-12 F/cm and ni = 1.5 × 1010/cm3, the width of base WB for this transistor will be ________(in μm)

Answer (Detailed Solution Below) 1.5 - 1.7

Base Width Modulation Question 3 Detailed Solution

Under punch through condition the depletion region covers the entire base region. Hence the base metallurgical width is equal to depletion width in base

WB=2εsiVpteNB

Here given punch through voltage bias of base and collector VBC = 10 + VBi

Vbi = built in voltage 

=KTqln(NCNBni2)

=25mVln(5×1018×5×10151.5×1.5×1020)

= 0.808 V

∴ VBC­ = 10.808 V

WB=2×1012×10.8081.6×1019×5×1015

= 1.64 × 10-4 cm

= 1.64 μm

Base Width Modulation Question 4:

An npn BJT is operating in the active region. If the reverse bias across the base-collector junction is increased, then

  1. The effective base width increases and common-emitter current gain increases
  2. The effective base width increases and common-emitter current gain decreases
  3. The effective base width decreases and common-emitter current gain increases
  4. The effective base width decreases and common-emitter current gain decreases

Answer (Detailed Solution Below)

Option 3 : The effective base width decreases and common-emitter current gain increases

Base Width Modulation Question 4 Detailed Solution

2nd Review of GATE 2017 Questions PART 2.docx 4

  • As the reverse-biased base-collector voltage is increased, the transition (or) the depletion region of the base-collector junction is increased resulting in the extension of this region more towards P-side (or base side), thereby reducing the effective base width.
  • This reduction in the effective base-width results in the increase in current gain as well because of the increase in the slope of concentration gradient variation from the emitter side to the collector side.

Base Width Modulation Question 5:

Consider a uniformly doped silicon bipolar transistor with a metallurgical base width of 0.5 μm and a base doping of NB = 1016 cm-3. The punch-through voltage Vpt is given as Vpt = 25 V with Punch through voltage defined as the base-collector voltage responsible for B-C depletion region to penetrate completely through the base. The collector doping concentration to meet the given punch-through voltage is (up to 2 decimal places) _____________× 1014 cm-3.(Take ϵr = 11.7)

(Assume bias voltage at collector-base junction is very large as compared to built-in voltage at base-collector region)

Answer (Detailed Solution Below) 8.00 - 8.50

Base Width Modulation Question 5 Detailed Solution

Concept:

The depletion region extending to the base is defined as:

xb=(2ϵs(Vbi+VR)qNcNB1(NC+NB))1/2

NC, NB = Carrier and base doping concentrations

VR = Applied reverse bias voltage

Since punch thorough voltage (Vpt) >> Vbi, we can neglect Vbi , the above equation can be rearranged as:

Vpt=exBo22ϵsNB(NC+NB)NC

XB0 = Metallurgical base width

Calculation:

Putting on the respective values, we get:

25=(1.6×1019)(0.5×104)2(1016)(NC+1016)2(11.7)(8.85×1014)NC

12.94=1+1016NC

NC = 8.38 × 1014 cm-3

Base Width Modulation Question 6:

A uniformly doped silicon bipolar transistor with a metallurgical base width of 0.5μm and base doping NB=1016cm3. For a punch through voltage Vpt=25V, the collector doping concentration is.

  1. 3.8×1014cm3
  2. 8.4×1014cm3
  3. 1.9×1014cm3
  4. 4.8×1014cm3

Answer (Detailed Solution Below)

Option 2 : 8.4×1014cm3

Base Width Modulation Question 6 Detailed Solution

We have WBNB=WCNCWCWB=NBNC

Now, total depletion width of the collector base junction be W=WB+WC=2ϵe(NB+NCNBNC)VR

WB(1+WCWB)=2ϵe(NB+NCNBNC)VR

WB(1+NBNC)=2ϵe(NB+NCNBNC)VR(WCWB=NBNC)

WB(NB+NCNC)=2ϵe(NB+NCNBNC)VR

Now, for a reverse bias VR=Vpt, we have depletion width in base region attain its maximum value WB=0.5μm. Thus, we have 

Vpt=WB2(NB+NCNC)2(e2ϵ)(NBNCNB+NC)

We have

Vpt=eWB22ϵNB(NB+NCNC)25=(1.6×1019)(0.5×104)22×11.7×8.85×10141016(1+1016NC)1+1016NC=12.94NC=8.38×1014cm3

Base Width Modulation Question 7:

A uniformly doped silicon (ni=1.5×1010cm3)bipolar transistor at T=300K with base doping NB=5×1016cm3 and collector doping NC=2×1015cm3. The metallurgical base width is 0.7μm. The rate of change of depletion width on base side xdB with respect to reverse biasVCB,dxdBdvcB at VCB=1.11V is:

  1. 1.2×108m/V
  2. 2.4×106cm/V
  3. 2.4×107m/V
  4. 6×108m/V

Answer (Detailed Solution Below)

Option 1 : 1.2×108m/V

Base Width Modulation Question 7 Detailed Solution

Depletion width on base side xdB is

xdB={2q(NcNB1(NB+NC))(Vbi+VCB)}12xdB={2×11.7×8.85×1014(1.6×1019)(2×10155×101615.2×1016)(Vbi+VR)}12xdB={(9.96×1012)(Vbi+VCB)}12

Built-in potential, Vbi=VTln(NBNCni2)

Vbi=(0.0259)ln(5×1016×2×1015(1.5×1010)2)Vbi=0.695V

Now, dxdBdVCB=3.156×1062Vbi+VCB

dxdBdvCB|VCB=1.11=3.156×10620.695+1.11dxdBdvCB|VCB=1.11=1.18×108m/V

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